32nd International Workshop

on Oxide Electronics

Sendai, Japan

September 27 – 30, 2026

Committees

International committee

Charles H. Ahn, Yale University
Lambert Alff, Technical University of Darmstadt
Ariando, National University of Singapore
Woo Seok Choi, Sungkyunkwan University
Chang-Beom Eom, University of Wisconsin-Madison
Jennifer Fowlie, Northwestern University
Marta Gibert, Vienna University of Technology
Masashi Kawasaki, University of Tokyo
Hideomi Koinuma, University of Tokyo*
Jochen Mannhart, Max Planck Institute Stuttgart
Daniele Marre, University of Genova
Laurence Méchin, CNRS Caen
Guus Rijnders, University of Twente
Darrell G. Schlom, Cornell University
Yuichi Shimakawa, Kyoto University
Hitoshi Tabata, University of Tokyo
Jean-Marc Triscone, University of Geneva
T. Venky Venkatesan, National University of Singapore*

*Emeritus member

Local committee

Chair: Hiroshi Kumigashira (Tohoku University)
Vice Chair: Akira Ohtomo (Institute of Science Tokyo)
Vice Chair: Kei Takahashi (Kanazawa University)

Yuji Matsumoto (Tohoku University)
Tomoteru Fukumura (Tohoku University)
Miho Kitamura (QST, NanoTerasu)
Atsushi Tsukazaki (University of Tokyo)
Masashi Kawasaki (University of Tokyo)
Hitoshi Tabata (University of Tokyo)
Yuichi Shimakawa (Kyoto University)
Hideomi Koinuma (University of Tokyo)

Program committee

Jobu Matsuno (Osaka University)
Mikk Lippmaa (The University of Tokyo)
Daisuke Kan (Osaka University)